Standard guide for analysis and reporting the impurity content and grade of high purity metallic sputtering targets for electronic thin film applications

YS/T 935-2013 Standard guide for analysis and reporting the impurity content and grade of high purity metallic sputtering targets for electronic thin film applications
Standard No.:	YS/T 935-2013	Status:	VALID remind me the status change Email:
Target Language:	English	File Format:	PDF
Word Count:	4000 words	Translation Price:	120 (USD) remind me the price change Email:
Implemented on:	2014-03-01	Delivery:	via email in 1-3 business day
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Standard No.:	YS/T 935-2013
Chinese Name:	电子薄膜用高纯金属溅射靶材纯度等级及杂质含量分析和报告标准指南
English Name:	Standard guide for analysis and reporting the impurity content and grade of high purity metallic sputtering targets for electronic thin film applications
Professional Classification:	H68 Precious metals and their alloys
Professional Classification:	YS Professional Standard - Non-ferrous Metal
ICS Classification:	77.150.99 Other products of non-ferrous metals
Issued by:
Issued on:	2013-10-17
Implemented on:	2014-03-01
Status:	VALID
Target Language:	English
File Format:	PDF
Word Count:	4000 words
Translation Price:	120 (USD)
Delivery:	via email in 1-3 business day

YS/T 935-2013 The following standards are cited：

YS/T 935-2013 Cited by the following standards：