Method for chemical analysis of the high-purity arsenic—Inductive coupling plasma mass spectrum (ICP-MS) for determinating the concentration of elements in the high-purity arsenic

YS/T 34.1-2011 Method for chemical analysis of the high-purity arsenic—Inductive coupling plasma mass spectrum (ICP-MS) for determinating the concentration of elements in the high-purity arsenic
Standard No.:	YS/T 34.1-2011	Status:	VALID remind me the status change Email:
Target Language:	English	File Format:	PDF
Word Count:	6000 words	Translation Price:	180 (USD) remind me the price change Email:
Implemented on:	2012-07-01	Delivery:	via email in 1-3 business day
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Standard No.:	YS/T 34.1-2011
Chinese Name:	高纯砷化学分析方法电感耦合等离子体质谱法（ICP-MS）测定高纯砷中杂质含量
English Name:	Method for chemical analysis of the high-purity arsenic—Inductive coupling plasma mass spectrum (ICP-MS) for determinating the concentration of elements in the high-purity arsenic
Professional Classification:	H17 Semimetal and semiconductor material analysis method
ICS Classification:	77.040.30 Chemical analysis of metals
Issued by:
Issued on:	2011-12-20
Implemented on:	2012-07-01
Status:	VALID
Replace:	YS/T34.1～34.2-1992
Target Language:	English
File Format:	PDF
Word Count:	6000 words
Translation Price:	180 (USD)
Delivery:	via email in 1-3 business day

YS/T 34.1-2011 The following standards are cited：

YS/T 34.1-2011 Cited by the following standards：